Package structure and manufacturing method thereof

ABSTRACT

A package structure includes at least one die, an antenna element, and at least one through interlayer via. The antenna element is located on the at least one die. The at least one through interlayer via is located between the antenna element and the at least one die, wherein the antenna element is electrically connected to the at least one die through the at least one through interlayer via.

BACKGROUND

Semiconductor devices and integrated circuits are typically manufacturedon a single semiconductor wafer. The dies of the wafer may be processedand packaged with other semiconductor devices (e.g. antenna) or dies atthe wafer level, and various technologies have been developed for thewafer level packaging.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIG. 1A to FIG. 1H are schematic cross sectional views of various stagesin a manufacturing method of a package structure according to someexemplary embodiments of the present disclosure.

FIG. 2A to FIG. 2N are schematic cross sectional views of various stagesin a manufacturing method of a package structure according to someexemplary embodiments of the present disclosure.

FIG. 3 is a schematic top view illustrating a relative position betweena through interlayer via wall and a second redistribution layer depictedin FIG. 2B.

FIG. 4 is a schematic top view illustrating a relative position betweena through interlayer via wall and a second metallic pattern depicted inFIG. 2M.

FIG. 5 is a schematic top view illustrating a relative position betweena through interlayer via wall and a second metallic pattern according tosome exemplary embodiments of the present disclosure.

FIG. 6 is a schematic top view illustrating a ground plane portionaccording to some exemplary embodiments of the present disclosure.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the provided subjectmatter. Specific examples of components, values, operations, materials,arrangements, or the like, are described below to simplify the presentdisclosure. These are, of course, merely examples and are not intendedto be limiting. Other components, values, operations, materials,arrangements, or the like, are contemplated. For example, the formationof a first feature over or on a second feature in the description thatfollows may include embodiments in which the first and second featuresare formed in direct contact, and may also include embodiments in whichadditional features may be formed between the first and second features,such that the first and second features may not be in direct contact. Inaddition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition is for the purpose ofsimplicity and clarity and does not in itself dictate a relationshipbetween the various embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

In addition, terms, such as “first”, “second”, “third” and the like, maybe used herein for ease of description to describe similar or differentelement(s) or feature(s) as illustrated in the figures, and may be usedinterchangeably depending on the order of the presence or the contextsof the description.

Other features and processes may also be included. For example, testingstructures may be included to aid in the verification testing of the 3Dpackaging or 3DIC devices. The testing structures may include, forexample, test pads formed in a redistribution layer or on a substratethat allows the testing of the 3D packaging or 3DIC, the use of probesand/or probe cards, and the like. The verification testing may beperformed on intermediate structures as well as the final structure.Additionally, the structures and methods disclosed herein may be used inconjunction with testing methodologies that incorporate intermediateverification of known good dies to increase the yield and decreasecosts.

FIG. 1A to FIG. 1H are schematic cross sectional views of various stagesin a manufacturing method of a package structure according to someexemplary embodiments of the present disclosure. FIG. 6 is a schematictop view illustrating a ground plane portion of a redistribution layerin a package structure according to some exemplary embodiments of thepresent disclosure. In exemplary embodiments, the manufacturing methodis part of a wafer level packaging process. In FIG. 1A to FIG. 1H, onedie is shown to represent plural dies of the wafer, and a packagestructure 10 is shown to represent a package structure obtainedfollowing the manufacturing method, for example. In other embodiments,two chips or dies are shown to represent plural chips or dies of thewafer, and one or more package structures are shown to represent plural(semiconductor) package structures obtained following the(semiconductor) manufacturing method, the disclosure is not limitedthereto.

Referring to FIG. 1A, in some embodiments, a carrier 112 is provided,and the carrier 112 may be a glass carrier or any suitable carrier forthe manufacturing method of the package structure. In some embodiments,the carrier 112 is coated with a debond layer 114. The material of thedebond layer 114 may be any material suitable for debonding the carrier112 from the above layers disposed thereon. Next, a dielectric layer 116is formed on the carrier 112 by forming a dielectric material layer (notshown) over the carrier 112. The dielectric layer 116 may be formed by asuitable fabrication technique such as spin-coating, lamination,deposition or the like. In some embodiments, the dielectric layer 116 isa polymer layer; the polymer layer may include polyimide,polybenzoxazole (PBO), benzocyclobutene (BCB), Ajinomoto Buildup Film(ABF), Solder Resist film (SR), or the like.

As shown in FIG. 1A, an antenna element ATN is formed on the carrier112. In some embodiments, the antenna element ATN may be formed byforming a metallization material layer (not shown) over the carrier 112and patterning the metallization material layer to form a patternedmetallic layer (referred as the antenna element ATN). In someembodiments, the material of the antenna element ATN may includealuminum, titanium, copper, nickel, tungsten, and/or alloys thereof, theantenna element ATN may be formed by a suitable fabricating techniquesuch as deposition or electroplating, and may be patterned by a suitablepatterning process such as photolithography and etching.

Referring to FIG. 1B, in some embodiments, at least one throughinterlayer via (TIV) 120 is formed on the carrier 112, and the TIV 120is in contact with and electrically connected to the antenna elementATN. Only one TIV is shown here but the number of the TIV is not limitedby the descriptions herein. In some embodiments, the TIV 120 is athrough integrated fan-out (InFO) via. In certain embodiments, the TIV120 is physically connected and arranged near an edge of the antennaelement ATN. In some embodiments, the TIV 120 is formed byphotolithography, plating, photoresist stripping processes or any othersuitable method. In one embodiment, the TIV 120 may be formed by forminga mask pattern (not shown) with openings exposing a portion the antennaelement ATN and forming a metallic material filling the openings to formthe TIV 120 on the expose portion of the antenna element ATN byelectroplating or deposition and then removing the mask pattern.However, the disclosure is not limited thereto. In one embodiment, thematerial of the TIV 120 may include a metal material such as copper orcopper alloys, or the like. As shown in FIG. 1B, only one TIV 120 isshown; however, the disclosure is not limited thereto. In anotherembodiment, the number of the TIV can be selected based on the demand.

Referring to FIG. 1C, in some embodiments, the antenna element ATN andthe TIV 120 are in contact with and molded in a molding compound 130. Insome embodiments, the molding compound 130 covers the TIV 120, theantenna element ATN and the dielectric layer 116. In some embodiments,the molding compound 130 covers top surfaces and sidewalls of the TIV120 and the antenna element ATN, where the top surfaces of the TIV 120and the antenna element ATN are opposite to the carrier 112. In someembodiments, the material of the molding compound 130 has lowpermittivity (Dk) and low loss tangent (Df) properties. Depending on thefrequency range of the high speed applications, suitable materials ofthe molding compound 130 may be selected based on the requiredelectrical properties of the package structure.

Referring to FIG. 1D, in some embodiments, the molding compound 130 andthe TIV 120 are planarized until the TIV 120 is exposed. In certainembodiments, as shown in FIG. 1D, after the planarization, the TIV 120and the molding compound 130 become substantially leveled. In oneembodiment, the top surfaces of the TIV 120 and the molding compound 130are coplanar. In some embodiments, the molding compound 130 and the TIV120 are planarized through a grinding process or a chemical mechanicalpolishing (CMP) process. After the grinding process, a cleaning step maybe optionally performed, for example to clean and remove the residuegenerated from the grinding step. However, the disclosure is not limitedthereto, and the planarizing step may be performed through any othersuitable method.

Referring to FIG. 1E, in some embodiments, a first redistribution layer140 is formed on the TIV 120, the molding compound 130 and the antennaelement ATN. In some embodiments, the first redistribution layer 140 isphysically connected to the TIV 120 and is electrically connected to theantenna element ATN through the TIV 120. In addition to the routingfunction provided by the first distribution layer 140, a part of thefirst distribution layer 140 located above and overlapped with theantenna element ATN in the vertical projection is the ground planeportion GP, which functions as a ground plate for the antenna elementATN. In some embodiments, the ground plane portion GP acts as areflector for antenna radiation and ensures high gain/efficiency for theantenna when there is a specific distance (which is wavelengthdependent) between the antenna element ATN and the ground plane portionGP. Owing to such configuration, the distance between the antennaelement ATN and the ground plane portion GP is controllable by adjustingthe height of the TIV 120, thereby allowing fine pitch for later-formedconductive elements and better flexibility in the design of a printedcircuit board (which is connected to the package structure 10 throughthe later-formed conductive elements). In view thereof, a height of thepackage structure 10 may further be reduced. Additionally, in thedisclosure, except for the molding compound 130, no additionalsemiconductor element (e.g., passive components or active components) orother element made of metal or metallic materials present between theantenna element ATN and the ground plane portion GP, thereby ensuringthe reliability of antenna applications. The formation of the firstredistribution layer 140 includes sequentially forming one or morepolymer dielectric layers 142 and at least one metallization layer 144in alternation. In certain embodiments, as shown in FIG. 1E, themetallization layer 144 is sandwiched between the polymer dielectriclayers 142, but the top surface of the metallization layer 144 isexposed by the topmost layer of the polymer dielectric layers 142 andthe lowest layer of the metallization layers 144 is exposed by thelowest layer of the polymer dielectric layers 142 to connect the TIV120. In some embodiments, the material of the metallization layers 144includes aluminum, titanium, copper, nickel, tungsten, and/or alloysthereof, and the metallization layers 144 may be formed byelectroplating or deposition. In some embodiments, the material of thepolymer dielectric layers 142 includes polyimide, epoxy resin, acrylicresin, phenol resin, benzocyclobutene (BCB), polybenzooxazole (PBO), orany other suitable polymer-based dielectric material.

In some embodiments, a plurality of under-ball metallurgy (UBM) patterns150 may be disposed on the exposed top surface of the topmost layer ofthe metallization layers 144 for electrically connecting with conductiveelements (e.g. conductive balls), and/or at least one connection pad 152may be disposed on the exposed top surface of the topmost layer of themetallization layers 144 for electrically connecting with at least onesemiconductor elements (e.g., passive components or active components).As shown in FIG. 1E, for example, a plurality of the UBM patterns 150and a plurality of connection pads 152 are formed. In some embodiments,the materials of the UBM patterns 150 and the connection pads 152 mayinclude copper, nickel, titanium, tungsten, or alloys thereof or thelike, and may be formed by an electroplating process, for example. Inone embodiment, the material of the UBM patterns 150 may be the same asthat of the connection pads 152. In another embodiment, the material ofthe UBM patterns 150 may be different from that of the connection pads152. In one embodiment, there may be only the UBM patterns 150 presentedin the package structure; however, in another embodiment, there may beonly the connection pads 152. The number of the UBM patterns 150 and theconnection pad 152 is not limited in this disclosure.

Referring to FIG. 1F, after the first redistribution layer 140 isformed, a plurality of conductive elements 160 are formed on the firstredistribution layer 140. As shown in FIG. 1F, the conductive elements160 are disposed on the UBM patterns 150. In some embodiments, theconductive elements 160 may be disposed on the UBM patterns 150 by ballplacement process or reflow process. In some embodiments, the conductiveelements 160 are, for example, solder balls or ball grid array (BGA)balls. In some embodiments, the conductive elements 160 are connected tothe first redistribution layer 140 through the UBM patterns 150. Asshown in the FIG. 1F, some of the conductive elements 160 areelectrically connected to the antenna element ATN through the firstdistribution layer 140, the TIV 120 and the UMB patterns 150.

Referring to FIG. 1G, at least one die 170 is provided and disposed onthe first redistribution layer 140. As shown in FIG. 1G, the die 170 isdisposed on the connection pads 152, and is connected to the firstredistribution layer 140 through the connection pads 152. In someembodiments, the die 170 may be disposed on the connection pads 152through reflow process. In some embodiments, the conductive elements 160and the die 170 are formed on a surface of the first redistributionlayer 140, wherein the first redistribution layer 140 is located betweenthe molding compound 130 and the conductive elements 160 and between themolding compound 130 and the die 170. In some embodiments, as shown inFIG. 1G, the die 170 includes an active surface 170 a, a plurality ofpads 170 b distributed on the active surface 170 a, a passivation layer170 c covering the active surface 170 a and a portion of the pad 170 b,a plurality of conductive pillars 170 d, and a protection layer 170 e.The pads 170 b are partially exposed by the passivation layer 170 c, theconductive pillars 170 d are disposed on and electrically connected tothe pads 170 b, and the protection layer 170 e covers the passivationlayer 170 c and exposes the conductive pillars 170 d. As shown in FIG.1G, the die 170 is electrically connected to the first redistributionlayer 140 through the conductive pillars 170 d and the connection pads152; the die 170 is electrically connected to some of the conductiveelements 160 through the conductive pillars 170 d, the connection pads152, the first redistribution layer 140, and some of the UBM patterns150; and the die 170 is electrically connected to the antenna elementATN through the conductive pillars 170 d, the connection pads 152, thefirst redistribution layer 140, and the TIV 120. In the disclosure, thedie 170 is overlaid the antenna element ATN; that is, a positioninglocation of the die 170 is overlapped with a positioning location of theantenna element ATN in a vertical projection on the first redistributionlayer 140, which allows to reduce a layout area of the package structure10. Furthermore, the die 170 is not molded in the molding compound 130,a good thermal dissipation is achieved. The conductive pillars 170 d arecopper pillars, copper alloy pillar or other suitable metal pillars, forexample. In some embodiments, the protection layer 170 e may be apolybenzoxazole (PBO) layer, a polyimide (PI) layer or other suitablepolymers. In some alternative embodiments, the protection layer 170 emay be made of inorganic materials, such as silicon oxide, siliconnitride, silicon oxynitride, or any suitable dielectric material. Insome embodiments, an underfill material (not shown) may be providedbetween the die 170 and the connection pads 152 to enhance thereliability of the package.

As shown in FIG. 1G, only one die is presented for illustrativepurposes, however, it should be noted that one or more dies may beprovided. The die(s) described herein may be referred as a chip or anintegrated circuit (IC). In some embodiments, the die 170 includes atleast one wireless and radio frequency (RF) chip. In some embodiments,the die 170 may further include additional chip(s) of the same type ordifferent types. In alternative embodiments, more than one die 170 areprovided, and the dies 130, except for including at least one wirelessand RF chip, may include the same or different types of chips selectedfrom digital chips, analog chips or mixed signal chips,application-specific integrated circuit (“ASIC”) chips, sensor chips,memory chips, logic chips or voltage regulator chips.

Referring to FIG. 1H, in some embodiments, the carrier 112 is flipped(turned upside down) and then is debonded from the dielectric layer 116to form the package structure 10. In some embodiments, the dielectriclayer 116 is easily separated from the carrier 112 due to the debondlayer 114. In some embodiments, the carrier 112 is detached from thedielectric layer 116 through a debonding process and the carrier 112 andthe debond layer 114 are removed. In some embodiments, the dielectriclayer 116 remained on the antenna element ATN and the molding compound130 is served as a protection layer. Alternatively, in some embodiments,the dielectric layer 116 may be subsequently removed and the surface ofthe antenna element ATN is exposed. In some embodiments, a dicingprocess is performed to cut the wafer having a plurality of the packagestructures 10 into individual and separated package structures 10. Inone embodiment, the dicing process is a wafer dicing process includingmechanical blade sawing or laser cutting.

As shown in FIG. 1H, in some embodiments, the package structure 10includes the at least one TIV 120, the molding compound 130, the firstredistribution layer 140, the antenna element ATN, the conductiveelements 160, and the at least one die 170. The package structure 10further includes the UBM patterns 150 and the connection pads 152. Insome embodiments, the conductive elements 160 and the die 170 arelocated on and connected to the first redistribution layer 140 throughthe UBM patterns 150 and the connection pads 152, respectively. In someembodiments, the conductive elements 160 and the die 170 are located onthe same side of the first redistribution layer 140 and are not moldedin the molding compound 130 (outside of the molding compound 130), suchthat a good thermal dissipation is achieved. As shown in FIG. 1H, theTIV 120 connected to the surface of the first redistribution layer 140is molded in the molding compound 130 and is located at another side ofthe first redistribution layer 140 opposite to the conductive elements160 and the die 170. In some embodiments, the first redistribution layer140 is located between the conductive elements 160 and the moldingcompound 130 and is between the die 170 and the molding compound 130. Insome embodiments, the first redistribution layer 140 is located betweenthe conductive elements 160 and the antenna element ATN and TIV 120 andbetween the die 170 and the antenna element ATN. In some embodiments,the antenna element ATN is located on and physically connected to theTIV 120, and the antenna element ATN is electrically connected to thefirst redistribution layer 140 through the TIV 120. As shown in FIG. 1H,the TIV 120 is located between the antenna element ATN and the firstdistribution layer 140 and in contact with the antenna element ATN andthe first distribution layer 140, so that the antenna element ATN andthe first distribution layer 140 are electrically connected. In detail,the antenna element ATN and the TIV 120 are in contact with and moldedin the molding compound 130, where the top surface of the antennaelement ATN and bottom surface of the TIV 120 are not covered by themolding compound 130. In certain embodiments, the antenna element ATN islocated above the first redistribution layer 140 and the die 170,wherein a positioning location of the die 170 corresponds to and isoverlapped with a positioning location of the antenna element ATN (e.g.,the antenna element ATN is overlapped with the die 170 in a verticalprojection on the first redistribution layer 140).

Owing to the configuration of the antenna element ATN and the layout ofthe first redistribution layer 140, the first distribution layer 140 notonly provides routing function but also serves as the ground plane forthe antenna element ATN. Referring to FIG. 1H and FIG. 6, the groundplane portion GP includes openings Orp for isolating routings and thepads for connecting the conductive element(s) 160 from the rest of themetallization layer 144 and opening Opc corresponding to the locationsof the passive components of the die 170. In some embodiments, thelocation of the antenna element ATN corresponds to and is overlappedwith the location of the ground plane portion GP of the firstredistribution layer 140. As the die 170 is located outside of themolding compound 130 and there is no additional semiconductor element(e.g., passive components or active components) located between theantenna element ATN and the ground plane portion GP, better thermaldissipation for the die and better reliability of the package areattained and the array gain and efficiency of the antenna are enhanced.And, a distance between the antenna element ATN and the ground planeportion GP is controllable by adjusting the height of the TIV 120,thereby allowing fine pitch and better flexibility for later-formedconductive elements. Furthermore, due to the positioning location of thedie 170 is overlapped with the positioning location of the antennaelement ATN in a vertical projection, a compact layout area of thepackage structure 10 is achieved. In some embodiments, some of theconductive elements 160 are electrically connected to the die 170through some of the UBM patterns 150, the first redistribution layer140, the connection pads 152, and the conductive pillars 170 d. In someembodiments, some of the conductive elements 160 are electricallyconnected to the antenna element ATN through the UMB patterns 150, thefirst redistribution layer 140, and the TIVs 120.

FIG. 2A to FIG. 2N are schematic cross sectional views of various stagesin a manufacturing method of a package structure according to someexemplary embodiments of the present disclosure. FIG. 3 is a schematictop view illustrating a relative position between a through interlayervia wall and a second redistribution layer depicted in FIG. 2B. FIG. 4is a schematic top view illustrating a relative position between athrough interlayer via wall and a second metallic pattern depicted inFIG. 2M. The elements similar to or substantially the same as theelements described previously will use the same reference numbers, andcertain details or descriptions of the same elements may not be repeatedherein. In FIG. 2A to FIG. 2N, one die is shown to represent plural diesof the wafer, and a package structure 20 is shown to represent a packagestructure obtained following the manufacturing method, for example. Inother embodiments, two chips or dies are shown to represent plural chipsor dies of the wafer, and one or more package structures are shown torepresent plural (semiconductor) package structures obtained followingthe (semiconductor) manufacturing method, the disclosure is not limitedthereto.

Referring to FIG. 2A, in some embodiments, a carrier 212 is provided,and the carrier 212 may be a glass carrier or any suitable carrier forthe manufacturing method of the package structure. In some embodiments,the carrier 212 is coated with a debond layer 214. The material of thedebond layer 214 may be any material suitable for debonding the carrier212 from the above layers disposed thereon. Next, a secondredistribution layer 240 is formed on the carrier 212. The formation ofthe second redistribution layer 240 includes sequentially forming one ormore polymer dielectric layers 242 and one or more metallization layers244 in alternation. The materials of the second redistribution layer 240and the formation methods similar to the processes for forming the firstredistribution layer 140 as described in FIG. 1E may not be repeatedherein. As shown in FIG. 2A, the second redistribution layer 240includes one polymer dielectric layer 242 and one metallization layer244, and a top surface (not marked) of the metallization layer 244 isexposed.

Referring to FIG. 2B, in some embodiments, a through interlayer via(TIV) wall 220 is formed on the carrier 212, and the TIV wall 220 isphysically connected to the metallization layer 244. In someembodiments, the TIV wall 220 is a through integrated fan-out (InFO)via, and a shape of the TIV wall is in a form of a hollow rectangularframe (as shown in FIG. 3), a hollow circular frame (not shown), ahollow square frame (not shown), or a hollow polygonal frame (notshown), etc. In certain embodiments, the TIV wall 220 is arranged alongthe edge of the metallization layer 244. In some embodiments, the TIVwall 220 is formed by photolithography, plating, photoresist strippingprocesses or any other suitable method. In one embodiment, the TIV wall220 may be formed by forming a mask pattern (not shown) covering themetallization layer 244 and the polymer dielectric layer 242 withopenings exposing a portion of the metallization layer 244, forming ametallic material filling the openings to form the TIV wall 220 byelectroplating or deposition and then removing the mask pattern.However, the disclosure is not limited thereto. In one embodiment, thematerial of the TIV wall 220 may include a metal material such as copperor copper alloys, or the like.

Referring to FIG. 2C, in some embodiments, the second redistributionlayer 240 and the TIV wall 220 are partially molded in a moldingcompound 230 a. In some embodiments, the molding compound 230 a at leastfills the gaps between the TIV wall 220 of two package structures 20 andbetween the TIV wall 220 and the metallization layer 244, and covers anouter sidewall of the TIV wall (opposite to an inner sidewall 220 a), aportion of the polymer dielectric layer 242 exposed by the secondredistribution layer 240 and a portion of the second redistributionlayer 240. In some embodiments, the molding compound 230 a is not formedon the inner sidewall 220 a of the TIV wall 220 and a surface (e.g., asurface 244 a of the metallization layer 244, see FIG. 3) of the secondredistribution layer 240 surrounded by the TIV wall 220. In someembodiments, the molding compound 230 a, for example, may includepolymers (such as epoxy resins, phenolic resins, silicon-containingresins, or other suitable resins), dielectric materials having lowpermittivity (Dk) and low loss tangent (Df) properties, or othersuitable materials. Depending on the frequency range of the high speedapplications, suitable materials of the molding compound 230 a may beselected based on the required electrical properties of the packagestructure. In some embodiments, the formation of the molding compound230 a may include placing a mask (not shown) atop the TIV wall 220, inwhich the inner sidewall 220 a of the TIV wall 220 and the surface 244 aof the metallization layer 244 of the second redistribution layer 240are covered by the mask; then forming the molding compound 230 a on theTIV wall 220 and the second redistribution layer 240 that are exposed bythe mask; finally, removing the mask. In the disclosure, the formationof the molding compound 230 a is not limited thereto, other suitableformation method may be applied. In certain embodiments, as shown inFIG. 2C, the TIV wall 220 and the molding compound 230 a becomesubstantially leveled. In one embodiment, as shown in FIG. 2C, the topsurfaces of the TIV wall 220 and the molding compound 230 a arecoplanar. In some embodiments, a grinding process or a chemicalmechanical polishing (CMP) process may further be applied to planarizethe molding compound 230 a and the TIV wall 22, and thus the moldingcompound 230 a is leveled with the TIV wall 220. After the grindingprocess, a cleaning step may be optionally performed, for example toclean and remove the residue generated from the grinding step. However,the disclosure is not limited thereto, and the grinding step may beperformed through any other suitable method.

Referring to FIG. 2D, in some embodiments, the carrier 212 is flipped(turned upside down) and then debonded from the second redistributionlayer 240. In some embodiments, the second redistribution layer 240 iseasily separated from the carrier 212 due to the debond layer 214, andthe polymer dielectric layer 242 of the second redistribution layer 240is exposed. In some embodiments, the carrier 212 is detached from thesecond redistribution layer 240 through a debonding process and thecarrier 212 and the debond layer 214 are removed.

Referring to FIG. 2E, in some embodiments, the second redistributionlayer 240 is placed on a carrier 112. In some embodiments, the carrier112 is coated with a debond layer 114. The material of the debond layer114 may be any material suitable for debonding the carrier 112 from theabove layers disposed thereon. As shown in FIG. 2D, the secondredistribution layer 240 debonded from the carrier 212 is disposed onthe carrier 112 by contacting the TIV wall 220 and the carrier 112 tothe debond layer 114. Next, the polymer dielectric layer 242 of thesecond redistribution layer 240 exposed is patterned to form openings242 a exposing a portion of the metallization layer 244, see FIG. 2E. Insome embodiments, patterning the polymer dielectric layer 242 of thesecond redistribution layer 240 can be performed by laser drilling.

Referring to FIG. 2F, in some embodiments, one or more throughinterlayer vias (TIVs) 120 are formed on the carrier 112, and the TIV120 is physically connected to the metallization layer 244 of the secondredistribution layer 240. As shown in FIG. 2F, the TIVs 120 are formedon the second redistribution layer 240 and electrically connected to theTIV wall 220 through the metallization layer 244 exposed by the openings242 a. The material of the TIVs 120 and the formation method is the sameor similar to what is described in FIG. 1B, and thus is not repeatedherein.

As shown in FIG. 2F, at least one die 170 is provided and disposed onthe second redistribution layer 240. In some embodiments, a die attachfilm DA is provided between a back side (not marked) of the die 170 andthe polymer dielectric layer 242 of the second redistribution layer 240,so as the die 170 are stably adhered to the polymer dielectric layer 242of the second redistribution layer 240. In some embodiments, as shown inFIG. 2F, the die 170 includes an active surface 170 a (opposite to theback side of the die 170), a plurality of pads 170 b distributed on theactive surface 170 a, a passivation layer 170 c covering the activesurface 170 a and a portion of the pad 170 b, a plurality of conductivepillars 170 d, and a protection layer 170 e. The pads 170 b arepartially exposed by the passivation layer 170 c, the conductive pillars170 d are disposed on and electrically connected to the pads 170 b, andthe protection layer 170 e covers the passivation layer 170 c andexposes the conductive pillars 170 d. The types of the die 170 and thematerials of components of the die 170 are the same or similar to whatis described in FIG. 1G, and thus is not repeated herein.

Referring to FIG. 2G, in some embodiments, the TIVs 120 and the die 170are molded in a molding compound 230 b. In some embodiments, the moldingcompound 230 b at least fills the gaps between the TIVs 120 and betweenthe TIVs 120 and the die 170, and covers sidewalls and top surfaces ofthe TIVs 120 and the die 170 and a surface of the polymer dielectriclayer 242 exposed by the TIVs 120 and the die 170. In some embodiments,the molding compound 230 b, for example, may include polymers (such asepoxy resins, phenolic resins, silicon-containing resins, or othersuitable resins), dielectric materials having low permittivity (Dk) andlow loss tangent (Df) properties, or other suitable materials. Dependingon the frequency range of the high speed applications, suitablematerials of the molding compound 230 b may be selected based on therequired electrical properties of the package structure. In thedisclosure, the molding compound 230 a and the molding compound 230 bare together referred as the molding compound 230; that is, the moldingcompound 230 includes the molding compound 230 a and the moldingcompound 230 b. In one embodiment, the materials of the molding compound230 a and the molding compound 230 b can be the same, however thedisclosure is not limited thereto. In one embodiment, the materials ofthe molding compound 230 a and the molding compound 230 b can bedifferent.

Referring to FIG. 2H, in some embodiments, the molding compound 230 band the TIVs 120 are planarized until and the top surfaces of the TIVs120 and the conductive pillars 170 d and the protection layer 170 e ofthe die 170 are exposed. In certain embodiments, as shown in FIG. 2H,after the planarization, the conductive pillars 170 d and the protectionlayer 170 e of the die 170 become substantially leveled with the TIVs120 and the molding compound 230 b. In one embodiment, the top surfacesof the TIVs 120, the conductive pillars 170 d, the protection layer 170e and the molding compound 230 b are coplanar. In some embodiments, themolding compound 230 b and the TIVs 120 are planarized through agrinding process or a chemical mechanical polishing (CMP) process. Afterthe grinding process, a cleaning step may be optionally performed, forexample to clean and remove the residue generated from the grindingstep. However, the disclosure is not limited thereto, and theplanarizing step may be performed through any other suitable method.

Referring to FIG. 2I, in some embodiments, a first redistribution layer140 is formed on the carrier 112. In some embodiments, the firstredistribution layer 140 is formed on the TIVs 120, the die 170 and themolding compound 230 (including the molding compound 230 a and themolding compound 230 b), and is physically connected to the die 170 andthe TIVs 120. As shown in FIG. 2I, the first redistribution layer 140 iselectrically connected to the second redistribution layer 240 throughthe TIVs 120, the first redistribution layer 140 is electricallyconnected to the die 170 through the pads 170 b and the conductivepillars 170 d, and the first redistribution layer 140 is electricallyconnected to the second TIV wall through the TIVs 120 and the secondredistribution layer 240. In some embodiments, the first redistributionlayer 140 includes one or more polymer dielectric layers 142 and one ormore metallization layers 144 arranged in alternation. The material ofthe first redistribution layer 140 and the formation method is describedin FIG. 1E, and thus is not repeated herein. As shown in FIG. 2I, thedie 170 is disposed between the first redistribution layer 140 and thesecond redistribution layer 240.

Next, in some embodiments, a plurality of under-ball metallurgy (UBM)patterns 150 may be disposed on some of the top surface of the topmostlayer of the metallization layers 144 exposed by the topmost layer ofthe polymer dielectric layers 142 for electrically connecting withconductive elements (e.g. conductive balls). As shown in FIG. 2I, forexample, a plurality of the UBM patterns 150 are formed. In someembodiments, the materials of the UBM patterns 150 may include copper,nickel, titanium, tungsten, or alloys thereof or the like, and may beformed by an electroplating process, for example. The number of the UBMpatterns 150 is not limited in this disclosure.

Referring to FIG. 2J, in some embodiments, after the firstredistribution layer 140 is formed, a plurality of conductive elements160 are formed on the first redistribution layer 140, and areelectrically connected to the first redistribution layer 140 through theUMB patterns 150. In some embodiments, the first redistribution layer140 is located between the molding compound 230 and the conductiveelements 160, between the conductive elements 160 and the die 170, andbetween the conductive elements 160 and the TIVs 120. As shown in FIG.2J, the conductive elements 160 are physically connected to the UBMpatterns 150. In some embodiments, the conductive elements 160 may bedisposed on the UBM patterns 150 by ball placement process or reflowprocess. In some embodiments, the conductive elements 160 are, forexample, solder balls or ball grid array (BGA) balls. In someembodiments, the conductive elements 160 are electrically connected tothe first redistribution layer 140 through the UBM patterns 150. In someembodiments, some of the conductive elements 160 are electricallyconnected to the die 170 through the UMB patterns 150, the firstdistribution layer 140, and the conductive pillars 170 d of the die 170.In some embodiments, some of the conductive elements 160 areelectrically connected to the second redistribution layer 240 throughthe UMB patterns 150, the first distribution layer 140, and the TIVs120.

Referring to FIG. 2K, in some embodiments, the carrier 112 is flipped(turned upside down) and then debonded from the molding compound 230 andthe TIV wall 220. The molding compound 230 and the TIV wall 220 areeasily separated from the carrier 112 due to the debond layer 114, andthe inner sidewall 220 a of the TIV wall 220, the surface 244 a of themetallization layer 244 surrounded by the TIV wall 220, and a surface ofthe molding compound 230 are exposed. In some embodiments, the carrier112 is detached from the molding compound 230, the TIV wall 220 and themolding compound 230 through a debonding process and the carrier 112 andthe debond layer 114 are removed.

Referring to FIG. 2L, in some embodiments, the conductive elements 160are mounted into a polymer film PF, wherein the conductive elements 160are completely embedded in the polymer film PF. In some embodiments, thematerial of the polymer film PF may include a polymer film havingsufficient elasticity to allow the conductive elements 160 beingembedded therein. In some embodiments, the polymer film PF may be aparafilm or a film made of other suitable soft polymer materials or thelike. Next, as shown in FIG. 2L, in some embodiments, a cap layer 180having a first metallic pattern 182 disposed thereon is provided and isdisposed on the molding compound 230 and the TIV wall 220 debonded fromthe carrier 112. In some embodiments, the material of the cap layer 180may include dielectric materials having low permittivity (Dk) and lowloss tangent (Df) properties, or other suitable materials; for example,fused silica (having Dk˜3.80 and Df<0.001). In certain embodiments, thecap layer 180 is disposed on the TIV wall 220 and the molding compound230 through adhesives. In some embodiments, as shown in FIG. 2L and FIG.4, disposing the cap layer 180 on the TIV wall 220 and the moldingcompound 230, for example, include connecting at least a portion of thefirst metallic pattern 182 to a portion of the TIV wall 220 of apredetermined overlapping region OP through a conductive adhesivematerial (not shown), as so the first metallic pattern 182 iselectrically connected to the TIV wall 220, and connecting a surface 180a of the cap layer 180 exposed by the first metallic pattern 182 to therest of the TIV wall 220 and the molding compound 230 through theadhesive layer 181. In the disclosure, the material of the adhesiveslayer 181 can be any suitable non-conductive adhesives or glues.

In an alternative embodiment, as shown in FIG. 2L and FIG. 5, a portionof the first metallic pattern 182 is connected to the portion of the TIVwall 220 of a predetermined overlapping region OP through a conductiveadhesive material (not shown), wherein the portion of the TIV wall 220of the predetermined overlapping region OP connected to the firstmetallic pattern 182 is separated from the rest of the TIV wall by gaps,and the first metallic pattern 182 and the portion of the TIV wall 220of the predetermined overlapping region OP connected to the firstmetallic pattern 182 are electrically connected to the rest of the TIVwall 220 through the metallization layer 244 of the second registrationlayer 240; and the surface 180 a of the cap layer 180 exposed by thefirst metallic pattern 182 is connected to the rest of the TIV wall 220and the molding compound 230 through the adhesive layer 181. In someembodiments, prior to disposing the cap layer 180 on the TIV wall 220and the molding compound 230, a patterning process may be performed toform gaps in the TIV wall, as shown in FIG. 5. For example, thepatterning process may include photolithography and etching.

As shown in FIG. 2L, a surface of the first metallic pattern 182opposite to the cap layer 180, the first side 180 a of the cap layer180, the surface 244 a of the metallization layer 244 of the secondredistribution layer 240, the inner sidewall 220 a of the TIV wall 220together define an empty space S (i.e. an air cavity AC), where the airhas low permittivity (Dk) and low loss tangent (Df) properties. In someembodiments, the first metallic pattern 182 and the portion of the TIVwall 220 connected to the first metallic pattern 182 together form anantenna element ATN, wherein the first distribution layer 140 is notonly providing a routing function but a part of the second distributionlayer 240 located below and overlapped with the antenna element ATN isserved as a ground plate GP for the antenna element ATN. Owing to suchconfiguration, a distance between the antenna element ATN and the groundplate GP is controllable by adjusting the height of the TIV wall 220,thereby allowing fine pitch for later-formed conductive elements andbetter flexibility in the design of a printed circuit board (which isconnected to the package structure 20 through the later-formedconductive elements). In the disclosure, the ground plane portion GPacts as a reflector for antenna radiation and ensures its highgain/efficiency when there is certain distance (which is wavelengthdependent) between the antenna element ATN and the ground plane portionGP. Due to the cap layer 180 and the TIV wall 220, the antenna elementATN is capable of having high-gain radiation along a first direction Yand avoiding surface wave/edge radiation along a second direction X.Additionally, in the disclosure, no additional semiconductor element(e.g., passive components or active components) or other element made ofmetal material and/or high-k dielectric materials is presented betweenthe antenna element ATN and the ground plate GP, thereby ensuring thereliability of antenna applications. As shown in FIG. 2L, the antennaelement ATN is overlaid the die 170; that is, a positioning location ofthe die 170 is overlapped with a positioning location of the antennaelement ATN in a vertical projection on the first redistribution layer140, which allows to reduce a layout area of the package structure 20 ascomparing to a conventional side-by-side configuration of an antennaelement and a ground plate. As shown in FIG. 2L, the antenna element ATNpartially contacts the molding compound 230 a.

Referring to FIG. 2M, in some embodiments, after the cap layer 180 isdisposed on the TIV wall 220 and the molding compound 230, a secondmetallic pattern 184 is formed on a second side 180 b of the cap layer180, wherein the second side 180 b is opposite to the first side 180 adisposed with the first metallic pattern 182 (or saying, the antennaelement ATN). In some embodiments, the second metallic pattern 184 isdisposed over the TIV wall 220, wherein the second metallic pattern 184is formed in a metallic ring structure, and a shape of the secondmetallic pattern 184 corresponds to a shape of the TIV wall 220 (seeFIG. 4), and the cap layer 180 is located between the first metallicpattern 182 (and the antenna element ATN) and the second metallicpattern 184. The surface wave/edge radiation of the antenna element ATNalong the second direction X is reduced due to the second metallicpattern 184 enables the surface wave to be reflected and thus reducesthe unwanted edge radiation in the antenna system. In some embodiments,the second metallic pattern 184 is formed by photolithography,deposition, photoresist stripping processes or any other suitablemethod. In one embodiment, the second metallic pattern 184 may be formedby forming a mask pattern (not shown) covering the second side 180 b ofthe cap layer 180 with openings exposing a portion of the cap layer 180,forming a metallic material filling the openings to form second metallicpattern 184 by deposition and then removing the mask pattern, but thedisclosure is not limited thereto. In one embodiment, the material ofthe second metallic pattern 184 may include a metal material such ascopper or copper alloys, or the like. However, the disclosure is notlimited thereto; in an alternative embodiment, the second metallicpattern 184, for example, may be formed on the cap layer 180 prior todisposing the cap layer 180 on the TIV wall 220 and the molding compound230.

Referring to FIG. 2N, in some embodiments, the conductive elements 160is released from the polymer film PF to form the package structure 20,and the first redistribution layer 140 and the conductive elements 160are exposed. In some embodiments, a dicing process is performed to cutthe wafer having a plurality of the package structures 20 intoindividual and separated package structures 20. In one embodiment, thedicing process is a wafer dicing process including mechanical bladesawing or laser cutting.

Referring to FIG. 2N, in some embodiments, the package structure 20includes the TIVs 120, the first redistribution layer 140, theconductive elements 160, the at least one die 170, the cap layer 180,the first metallic pattern 182, the second metallic pattern 184, the TIVwall 220, the molding compound 230 (including the molding compound 230 aand the molding compound 230 b), the second redistribution layer 240,and the antenna element ATN. The package structure 20 further includesthe UBM patterns 150. In some embodiments, the die 170 and the TIVs 120located aside the die 170 are located on and physically connected to thefirst redistribution layer 140, and are molded in the molding compound230 (e.g. the molding compound 230 b). The conductive elements 160 aredisposed on a surface of the first redistribution layer 140 opposite tothe die 170 and the TIVs 120, and the first redistribution layer 140 islocated between the conductive elements 160 and the molding compound230. As shown in FIG. 2N, the second redistribution layer 240 is locatedon the molding compound 230 (e.g. the molding compound 230 a), the TIVs120, the die 170 and the first redistribution layer 140, and the secondredistribution layer 240 is electrically connected to the firstredistribution layer 140 through the TIVs 120 and is electricallyconnected to the first metallic pattern 182 through the TIV wall 220.The TIVs 120 and the die 170 are located between the firstredistribution layer 140 and the second redistribution layer 240.

In some embodiment, the TIV wall 220 is located on and physicallyconnected to the second redistribution layer 240, wherein the TIV wall220 and the second redistribution layer 240 are partially molded in thecompounding compound 230 a of the molding compound 230, and the innersidewall 220 a of the TIV wall 220 and the surface 244 a of the secondredistribution layer 240 are neither covered by nor in contact with themolding compound 230 (e.g. the molding compound 230 a). As shown in FIG.2N, the TIV wall 220 is electrically connected to the TIVs 120 throughthe second redistribution layer 240, and is electrically connected tothe first redistribution layer 140 through the second redistributionlayer 240 and the TIVs 120. In some embodiments, the cap layer 180 islocated on the molding compound 230 (e.g., the molding compound 230 a)and between the first metallic pattern 182 and the second metallicpattern 184, wherein the first metallic pattern 182 located on thesurface 180 a of the cap layer 180 is electrically connected to aportion of the TIV wall 220, and the second metallic pattern 184 islocated on the surface 180 b of the cap layer 180 is located over andoverlapped with the TIV wall 220 along a vertical projection on thefirst redistribution layer 140. As shown in FIG. 2N, the first metallicpattern 182 is located on the molding compound 230 and the TIV wall 220,the cap layer 180 is located on and covers the first metallic pattern182, and the second metallic pattern 184 is located on the cap layer180, wherein the cap layer 180 is sandwiched between the first metallicpattern 182 and the second metallic pattern 184. In some embodiments,the molding compound 230 is located between the cap layer 180 and thefirst redistribution layer 140.

In some embodiments, as shown in FIG. 2N, the first metallic pattern 182and the portion of the TIV wall 220 connected to the first metallicpattern 182 together form the antenna element ATN, wherein the firstdistribution layer 140 is not only providing a routing function but apart of the second distribution layer 240 located below the antennaelement ATN is served as a ground plate GP for the antenna element ATN.Owing to such configuration, a distance between the antenna element ATNand the ground plate GP is controllable by adjusting the height of theTIV wall 220, thereby allowing fine pitch for later-formed conductiveelements and better flexibility in the design of a printed circuit board(which is connected to the package structure 20 through the later-formedconductive elements). The ground plane portion GP acts as a reflectorfor antenna radiation and ensures its high gain/efficiency when there iscertain distance (which is wavelength dependent) between the antennaelement ATN and the ground plane portion GP. Due to the existence of theair cavity AC (air within the cavity having Dk=1, Df˜0) located betweenthe cap layer 180 and the TIV wall 220, the antenna element ATN iscapable of having high-gain radiation along the first direction Y andavoiding surface wave/edge radiation along the second direction X.Additionally, in the disclosure, no additional semiconductor element(e.g., passive components or active components) or other element made ofmetal material and/or high-k dielectric materials is presented betweenthe antenna element ATN and the ground plate GP, thereby ensuring thereliability of antenna applications. In some embodiments, the antennaelement ATN is located between the cap layer 180 and the secondredistribution layer 240. In some embodiments, some of the conductiveelements 160 are electrically connected to the die 170 through the UMBpatterns 150, the first redistribution layer 140, and the conductivepillars 170 d. In some embodiments, some of the conductive elements 160are electrically connected to the second redistribution layer 240through the UMB patterns 150, the first redistribution layer 140, andthe TIVs 120. In some embodiments, some of the conductive elements 160are electrically connected to the antenna element ATN through the UMBpatterns 150, the first redistribution layer 140, the TIVs 120, thesecond redistribution layer 240 and the TIV wall 220.

In some embodiments, the antenna element ATN partially contacts themolding compound 230 (e.g. the molding compound 230 a), wherein the sideof the antenna element ATN facing toward the second redistribution layer240, the side of the second redistribution layer 240 facing toward theantenna element ATN, the inner sidewall 220 a of the TIV wall 220 thatare not covered by the molding compound 230 (either the molding compound230 a or the molding compound 230 b) together define the space S for theair cavity AC. As shown in FIG. 2N, the air cavity AC is located betweenthe antenna element ATN, the second redistribution layer 240, and theTIV wall 220. In certain embodiments, the antenna element ATN iselectrically connected to the second redistribution layer 240 throughthe TIV wall 220 and is overlaid the die 170. That is, the positioninglocation of the die 170 is overlapped with the positioning location ofthe antenna element ATN in a vertical projection on the firstredistribution layer 140, which leads to a smaller layout area of thepackage structure 20 when comparing to a conventional side-by-sideconfiguration of an antenna element and a ground plate. In someembodiments, the shape of the second metallic pattern 184 located overthe TIV wall 220 corresponds to the shape of the TIV wall 220 (as shownin FIG. 4). Owing to the second metallic pattern 184, the surfacewave/edge radiation of the antenna element ATN along the seconddirection X is reduced.

According to some embodiments, a package structure includes a moldingcompound, an antenna element, at least one die, and a redistributionlayer. The antenna element is molded in the molding compound. The atleast one die is located on the molding compound. The redistributionlayer is located between the at least one die and the molding compound,wherein the redistribution layer includes a ground plane portion and alocation of the antenna element is overlapped with a location of theground plane portion in a vertical projection.

According to some embodiments, a package structure includes at least onedie, an antenna element, and a through interlayer via wall. The antennaelement is located above the at least one die. The through interlayervia wall is located between the antenna element and the at least onedie, wherein the through interlayer via wall is connected to the antennaelement, an air cavity is located between the antenna element and the atleast one die and surrounded by the through interlayer via wall, and theantenna element is electrically connected to the at least one die.

According to some embodiments, a manufacturing method of a packagestructure is provided with the following steps, forming a firstredistribution layer on a first carrier; forming at least one throughinterlayer via on the first carrier, wherein the at least one throughinterlayer via is electrically connected to the first redistributionlayer; encapsulating the at least one through interlayer via in amolding compound; disposing at least one die on the first carrier,wherein the at least one die is electrically connected to the firstredistribution layer; forming an antenna element, wherein the antennaelement is at least partially in contact with the molding compound andelectrically connected to the first redistribution layer, and theantenna element is overlapped with the at least one die in a verticalprojection on the first redistribution layer; and disposing conductiveelements on the first redistribution layer, wherein the firstredistribution layer is located between the molding compound and theconductive elements.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A package structure, comprising: a moldingcompound; an antenna element molded in the molding compound; at leastone die located on the molding compound; a redistribution layer locatedbetween the at least one die and the molding compound, wherein theredistribution layer includes a ground plane portion and a location ofthe antenna element is overlapped with a location of the ground planeportion in a vertical projection on the redistribution layer; andconductive elements connected to a first side of the redistributionlayer, wherein the at least one die is connected to the first side ofthe redistribution layer, and positioning locations of the conductiveelements are aside of a positioning location of the at least one die inthe vertical projection.
 2. The package structure of claim 1, furthercomprising at least one through interlayer via encapsulated in themolding compound, wherein the at least one through interlayer via isconnected to the antenna element and the antenna element is electricallyconnected to the at least one die through the redistribution layer andthe at least one through interlayer via.
 3. The package structure ofclaim 1, wherein the location of the antenna element is overlapped witha location of the at least one die in the vertical projection.
 4. Thepackage structure of claim 1, wherein the redistribution layer islocated between the conductive elements and the antenna element.
 5. Thepackage structure of claim 1, further comprising a protective layerlocated on the molding compound and covering the antenna element.
 6. Apackage structure, comprising: at least one die; an antenna elementlocated above the at least one die; and a through interlayer via wall,located between the antenna element and the at least one die, whereinthe through interlayer via wall is connected to the antenna element, anair cavity is located between the antenna element and the at least onedie and surrounded by the through interlayer via wall, and the antennaelement is electrically connected to the at least one die.
 7. Thepackage structure of claim 6, further comprising: a first redistributionlayer connected to the at least one die; a second redistribution layerlocated on the at least one die, wherein the at least one die is locatedbetween the first redistribution layer and the second redistributionlayer; and at least two through interlayer vias, connected to the firstredistribution layer and the second redistribution layer and arrangedaside the at least one die, wherein the antenna element is electricallyconnected to the at least one die through the through interlayer viawall, the second redistributor layer, the at least two throughinterlayer vias, and the first redistribution layer.
 8. The packagestructure of claim 7, further comprising a molding compound, wherein theantenna element, the through interlayer via wall, the at least one die,the second redistribution layer and the at least two through interlayervias are molded in the molding compound, wherein an inner sidewall ofthe through interlayer via wall, a surface of the antenna elementsurrounded by the inner sidewall of the through interlayer via wall andfacing toward the at least one die and a surface of the secondredistribution layer surrounded by the inner sidewall of the throughinterlayer via wall and facing toward the antenna element are free ofthe molding compound.
 9. The package structure of claim 7, furthercomprising: conductive elements, connected to the first redistributionlayer, wherein the first redistribution layer is located between theconductive elements and the at least one die.
 10. The package structureof claim 6, further comprising a cap layer, located on the antennaelement, wherein the antenna element is located between the cap layerand the through interlayer via wall; and a metallic ring structure,disposed on a surface of the cap layer opposite to the antenna element,wherein the metallic ring structure is located over the throughinterlayer via wall, and a shape of the metallic ring structurecorresponds to a shape of the through interlayer via wall.
 11. Amanufacturing method of a package structure, comprising: forming a firstredistribution layer on a first carrier; forming at least one throughinterlayer via on the first carrier, wherein the at least one throughinterlayer via is electrically connected to the first redistributionlayer; encapsulating the at least one through interlayer via in amolding compound; disposing at least one die on the first carrier,wherein the at least one die is electrically connected to the firstredistribution layer; forming an antenna element, wherein the antennaelement is at least partially in contact with the molding compound andelectrically connected to the first redistribution layer, and theantenna element is overlapped with the at least one die in a verticalprojection on the first redistribution layer; and disposing conductiveelements on the first redistribution layer, wherein the firstredistribution layer is located between the molding compound and theconductive elements.
 12. The manufacturing method of claim 11, whereinthe antenna element is formed on the first carrier before forming thefirst redistribution layer, the at least one through interlayer via andat least one die on the first carrier.
 13. The manufacturing method ofclaim 12, wherein after the at least one first through interlayer via isformed on the antenna element, the antenna element and the at least onethrough interlayer via are encapsulated in the molding compound, andthen the first distribution layer is formed on the at least one throughinterlayer via, wherein the at least one die and the conductive elementsare disposed on a surface of the first redistribution layer opposite tothe molding compound and are not molded in the molding compound.
 14. Themanufacturing method of claim 11, before disposing the at least one dieon the first carrier and forming the at least one through interlayervia, the first redistribution layer and the antenna element, furthercomprising: forming a second redistribution layer on a second carrier;and forming a through interlayer via wall on the second redistributionlayer, wherein the through interlayer via wall is electrically connectedto the second redistribution layer; encapsulating the secondredistribution layer and the through interlayer via wall in the moldingcompound; and debonding the second carrier from the secondredistribution layer and disposing the second redistribution layer onthe first carrier by contacting the through interlayer via wall and thefirst carrier.
 15. The manufacturing method of claim 14, whereinencapsulating the second redistribution layer and the through interlayervia wall comprises partially encapsulating the second redistributionlayer and the through interlayer via wall, wherein an inner sidewall ofthe through interlayer via wall and a side of the second redistributionlayer surrounded by the inner sidewall of the through interlayer viawall are not covered by the molding compound.
 16. The manufacturingmethod of claim 14, wherein disposing the at least one die comprisesdisposing the at least one die on a side of the second redistributionlayer opposite to the through interlayer via wall after the at least onethrough interlayer via being formed on the second redistribution layer,wherein the at least one die is formed on the side of the secondredistribution layer where the at least one through interlayer viadisposed, and encapsulating the at least one through interlayer via inthe molding compound comprises encapsulating the at least one die andthe at least one through interlayer via in the molding compound.
 17. Themanufacturing method of claim 14, wherein forming the firstredistribution layer comprises forming the first redistribution layer onthe molding compound after encapsulating the at least one throughinterlayer via, wherein the first distribution layer is electricallyconnected to the second redistribution layer through the at least onethrough interlayer via, and the at least one die is located between thefirst redistribution layer and the second redistribution layer.
 18. Themanufacturing method of claim 14, after disposing conductive elements onthe first redistribution layer, further comprising: debonding the firstcarrier from the through interlayer via wall and the molding compound;and mounting the conductive elements into a polymer film, wherein theconductive elements are embedded into the polymer film.
 19. Themanufacturing method of claim 18, after mounting the conductive elementsinto the polymer film, further comprising: providing a cap layer havinga first side disposed with a first metallic pattern; and disposing thecap layer on the through interlayer via wall and the molding compoundvia the first side, and wherein the first side of the cap layer, aninner sidewall of the through interlayer via wall, a side of the secondredistribution layer facing toward the first side of the cap layer andsurrounded by the inner sidewall of the through interlayer via wall thatnot covered by the molding compound constitute an accommodated space foran air cavity, and wherein forming an antenna element comprisesconnecting the first metallic pattern to a portion of the throughinterlayer via wall so that the first metallic pattern and the portionof the through interlayer via wall connected to the first metallicpattern together form the antenna element.
 20. The manufacturing methodof claim 19, further comprising: forming a second metallic pattern on asecond side of the cap layer opposite to the first side disposed withthe antenna element, wherein the second metallic pattern is disposedover the through interlayer via wall, a shape of the second metallicpattern corresponds to a shape of the through interlayer via wall, andthe cap layer is located between the antenna element and the secondmetallic pattern.